Effect of Current Density on Properties of Electrodeposited NickelFerrous-Phosphorus Alloy Thin Films

Authors

  • Dr. V. Sujatha Principal & Professor, Department of Electronics and Communication Engineering, Shree Sathyam College of Engineering and Technology, Sankari Taluk, Salem District, Tamil Nadu, India
  • Dr. T. Baskar Professor, Department of Physics, Shree Sathyam College of Engineering and Technology, Sankari Taluk, Tamil Nadu, India
  • Dr. A. Shaji George Director, Masters IT Solutions, Chennai, Tamil Nadu, India
  • A. S. Hovan George Student, Tbilisi State Medical University, Tbilisi, Georgia

DOI:

https://doi.org/10.5281/zenodo.7782802

Keywords:

Electrolytic bath, SEM, Crystalline size, VHN, Ni-Co, X-ray diffraction

Abstract

To create NiFeP nanostructured thin films, multiple current densities were maintained in electrodeposition. FCC structure is visible in the texture of NiFeP-deposited films. Experimentally observed thin film structural characteristics for various current densities were compared. The structural and mechanical qualities of nickal thin films will be enhanced by the addition of phosphorus (P). At different current densities of 2, 3, 4, and 5 mA/cm2, electrodeposited NiFeP films were created, and their morphological, structural, and mechanical characteristics were assessed. The nickel concentration peaked at 62.32 wt% at 5 mA/cm2. The nickel content increased as the current density increased. NiFeP films have a brilliant, uniform coating. NiFeP film deposition had average crystal sizes of 69 nm, which were likewise nanoscale.

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Published

2023-03-31

How to Cite

Dr. V. Sujatha, Dr. T. Baskar, Dr. A. Shaji George, & A. S. Hovan George. (2023). Effect of Current Density on Properties of Electrodeposited NickelFerrous-Phosphorus Alloy Thin Films. Partners Universal International Research Journal, 2(1), 168–173. https://doi.org/10.5281/zenodo.7782802

Issue

Vol. 2 No. 1 (2023): PUIRJ

Section

Articles