Effect of Different Concentration of Boron on Properties of Electroplated Nickel-ferrous-boron Alloy Thin Films
Keywords:VHN, SEM, VSM, Ni-B, Electroplating, electrolytic bath, crystalline size, X-ray diffraction
Electroplating was used to create magnetic alloy thin films of NiFeB at varied boron concentrations. NiFeB deposited films have an orientation that favours the FCC phase. Thin films with soft magnetic properties that were experimentally observed for various boron concentrations were compared. Boron (B) can improve the mechanical and structural qualities of nickel thin films. At various boron concentrations (10, 20, 30 and 40 g/l), electrodeposited NiFeB films were created and then subjected to morphological, structural, and mechanical characterisation study. At 40 g/l boron concentration, the minimum nickel level was 47.64 weight percent. Bright and evenly coated NiFeB films were present on the surface. Moreover, the NiFeB film deposition were nanoscale, with an average crystalline size of about 55 nm. High boron concentration-prepared thin films showed high levels of hardness. NiFeB had a microhardness of 153 VHN at a boron concentration of 40 g/l.